| 1. | Deposition and etching of amorphous carbon films in ecr plasma
离子体沉积和刻蚀非晶碳薄膜 |
| 2. | Preparation and friction properties of aligned membrane of amorphous carbon nanorods on aao template
模板上碳纳米棒定向膜的制备及摩擦性能分析 |
| 3. | Super - hard amorphous carbon films were deposited on such substrates as single - crystalline silicon and k9 glass by pulse laser ablating graphite target
本文研究用脉冲激光烧蚀石墨靶方法在单晶硅、 k9玻璃等衬底上生长超硬非晶碳膜。 |
| 4. | The method of amino ? roup doping into hydrogenated amorphous carbon ( ct - c : h ) film and the influence of technological condition on it had been exhaustedly discussed in the article
本文详细研究了对氢化碳膜进行胺基团掺杂的方法，工艺条件。 |
| 5. | As an environmentally benign and economically viable optoelectronic device material , amorphous carbon ( a - c ) films are of interests in various applications
作为一种经济适用并且环境友好的光电器件材料,非晶碳薄膜因其众多优良的特性而引起广泛研究兴趣。 |
| 6. | It is thought that the emission process happened with the participation of diamond crystal , graphite , amorphous carbon and intra - face states in the diamond films
认为非晶碳、石墨、金刚石及相应界面态构成一个完整的体系参与场发射，金刚石薄膜中杂相的存在有利于电子的场发射。 |
| 7. | The results show that amorphous carbon films have high etching resistance against oxygen plasma , and etch rates of the films correlated not only with etching processing parameters , also with deposition conditions
结果表明非晶碳膜对于氧离子体具有高的抗刻蚀性，其刻蚀率不仅与刻蚀的过程参量有关，而且决定于膜的沉积条件。 |
| 8. | Ion - assisted bombardment and direct current bias were emphasized in charter ii and charter iii respectively on studying how external factor as an assisted avenue can influence the growth of amorphous carbon film
第二章和第三章分别从引入离子轰击和施加直流偏压电场两方面着重研究了外界条件作为辅助手段对非晶碳生长的影响。 |
| 9. | These amorphous carbon tubes are totally different from those graphitized carbon nanotubes obtained through traditional methods . the simple and direct synthesis method is superior to the usual casting method by mesoporous silica materials
相对于利用中孔sio _ 2为模板合成的中孔碳材料，我们的合成方法更简单直接，并且如此大孔径的有序中孔碳材料也是首次报道。 |
| 10. | Consisted mainly of amorphous phase . hrem images showed that the ti - dlc film had a lamellar structure . the tic phase with a size of 5 nm was located at the titanium - rich regions surrounded by amorphous carbon structures in the ti - dlc film
Ti - dlc膜的结构主要为非晶相,高分辨电子显微镜分析( hrem )表明ti - dlc膜成层状分布,膜内存在着富ti区和贫ti区, tic颗粒尺寸大约为5nm 。 |
